Precision motion control in wafer stages
High precision positioning and highly coordinated moves with tight IO synchronisation
Our wafer stages program has been designed for high precision motion control within the nanometer range. It is therefore ideal for wafer alignment, positioning and testing in the quality control phase.
The precision motion control system MPC guarantees high precision with a 1 - 5 nm resolution as well as slow uniform motion ≥ 50 nm/s. Special servo motors and ironless linear and torque motors enhance dynamic performance. High-precision linear guides eliminate vibration. The addition of a pneumatic subsystem completes the automation package. Higher-order motion profiles and spline functions produce smoother motion sequences.